| Titre : | Modelling of Microfabrication Systems : with 140 figures | | Type de document : | texte imprimé | | Auteurs : | Raja Nassar, Auteur ; Weizhong Dai, Auteur | | Editeur : | Berlin Heidelberg : Springer-Verlag | | Année de publication : | 2003 | | Collection : | Microtechnology and MEMS | | Importance : | 269 p. | | Présentation : | couv. ill. en coul., ill. | | Format : | 23 cm. | | ISBN/ISSN/EAN : | 978-3-540-00252-9 | | Langues : | Anglais (eng) | | Catégories : | ELECTRONIQUE
| | Index. décimale : | 09-07 Physique des dispositifs éléctroniques | | Résumé : | This book addresses modeling of systems that are important to the fabrication of three-dimensional microstructures. Selected topics are ion beam micromachining, x-ray lithography, laser chemical vapor deposition, photopolymerization, laser ablation, and thin films. Models simulating the behavior of these systems are presented, graphically illusratted, and discussed in the light of experimental results. Knowledge gained from such models is essential for system operation and optimization. This book is unique in that it focuses on high aspect ratio microtechnology. It will be invaluable to scientists, engineers, graduate students, and manufacturers engaged in research and development for enhancing the accuracy and precision of microfabrication systems for commercial applications. | | Note de contenu : | Contents:
1-Ion Beam
2-X-ray Lithography
3-Laser Chemical Vapor Deposition
4-Laser Photopolymerization
5-Laser Ablation
6-Thin Films |
Modelling of Microfabrication Systems : with 140 figures [texte imprimé] / Raja Nassar, Auteur ; Weizhong Dai, Auteur . - Berlin Heidelberg : Springer-Verlag, 2003 . - 269 p. : couv. ill. en coul., ill. ; 23 cm.. - ( Microtechnology and MEMS) . ISBN : 978-3-540-00252-9 Langues : Anglais ( eng) | Catégories : | ELECTRONIQUE
| | Index. décimale : | 09-07 Physique des dispositifs éléctroniques | | Résumé : | This book addresses modeling of systems that are important to the fabrication of three-dimensional microstructures. Selected topics are ion beam micromachining, x-ray lithography, laser chemical vapor deposition, photopolymerization, laser ablation, and thin films. Models simulating the behavior of these systems are presented, graphically illusratted, and discussed in the light of experimental results. Knowledge gained from such models is essential for system operation and optimization. This book is unique in that it focuses on high aspect ratio microtechnology. It will be invaluable to scientists, engineers, graduate students, and manufacturers engaged in research and development for enhancing the accuracy and precision of microfabrication systems for commercial applications. | | Note de contenu : | Contents:
1-Ion Beam
2-X-ray Lithography
3-Laser Chemical Vapor Deposition
4-Laser Photopolymerization
5-Laser Ablation
6-Thin Films |
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